Model: WS-400BZ-6NPP
Equipment that enables the deposition of a uniform film, of high precision and nanometric thickness, on the surface of a ceramic, metal or polymer sample. It can be used to improve the photoresistance of silicon wafer surfaces.
Equipment that enables the deposition of a uniform film, of high precision and nanometric thickness, on the surface of a ceramic, metal or polymer sample. It can be used to improve the photoresistance of silicon wafer surfaces.