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Spin coater
Manufacturer: LAURELL
Model: WS-400BZ-6NPP

Equipment that enables the deposition of a uniform film, of high precision and nanometric thickness, on the surface of a ceramic, metal or polymer sample. It can be used to improve the photoresistance of silicon wafer surfaces.


The UPC offers the services performance that the equipment could carry out.

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Scientific and Technical Services at the UPC
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